![Copper Sputter Target [Cu] DN80CF despite a small increase in](https://cdn.shopify.com/s/files/1/0117/2714/2969/products/CuTarget.jpg?v=1539227820)
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despite a small increase in stiffness when irradiated with 4 MeV electrons to 1 MGy
SA00048 Available External manifold (9-way)
°F -15 to 250
Touchscreen controller GUI Full fluid reservoir indicator
it is robust
Copper Sputter Target [Cu] DN80CF despite a small increase inCopper Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom
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